Laboratoire intégré des microsystèmes (MEMS) / Gravure humide / Nettoyage de tranche
Akrion GAMA cleaning bench
Fournisseur :
Modèle :
Fonction :
Provide wet-chemical wafer cleaning, surface preparation, and etch
CAPABILITY:
Dry-in/dry-out automated SMIF pod input/output operation;
Mini-environment within wet bench secures class 1 clean room performance on the wafer surface;
Real time particle monitoring in chemical tanks;
Multiple lot/recipe processing (up to 4 recipes on single bench at the same time);
High throughput and low cost per wafer;
Real time chemical analysis and concentration adjustments:
