Integrated microsystems laboratory (MEMS) / Lithography / Coater/Developer
TEL Tokyo Cleantrack ACT-8
Supplier :
Model :
Purpose :
Photoresist spin-coater and developer
CAPACITY
Has direct interface with ASML stepper
Adapted to spin-coat negative tone and positive tone resists
KMPR-1005 (1002), with 90° walls
OIR-647-17(11), straight walls
Allows cyclopentanone or HMDS pre-wet for respective resists
Develops both positive and negative resists
Includes soft-bake and post-exposure bake capabilities
Develops dry films
