Analytical laboratory / Surface analysis / X-Ray photoelectron spectroscopy (XPS)
Physical Electronics – Quantera II
Supplier :
Model :
Purpose :
Molecular chemical analysis of the first atomic layers of a surface. Provides high sensitivity large and micro-area spectroscopy, superior inorganic and organic depth profiling and fully automated analysis of insulating or conductive samples.
CAPABILITY:
Focussed and scanned X-Ray beam for sample imaging and analysis
Xray spot size programmable between 9µm and 300µm (min. ≤ 7.5 µm)
Spherical capacitor energy analyser with multi-channel detection
High performance low voltage Argon sputter ion gun ( ≥ 5.0 µA @ 5 kV )
Dual beam charge compensation
Large travel 5 axis precision sample stage
Robotic sample platen handling
Sample size 75mm x 75mm x 25mm or 100 mm round (4 inch wafer)
Ultra high vacuum analytical chamber to prevent contamination
System vacuum ≤ 6.7 x10-8 Pa
Ar ion sputter gun differential pressure ≤ 6.7 x 10-6 Pa
Elemental sensitivity ≥ 15 000 cps at ≤ 0.6 eV, on Ag 3d5
Highest performance inorganic and organic sputter depth profiling
Hand-off dual beam charge neutralization
Fully automated and internet ready for remote operation
