Integrated microsystems laboratory (MEMS) / Photoresist Stripping and Ashing / Resist strip
Akrion GAMA alkali bench
CAPABILITY:
Dry-in/dry-out automated SMIF pod input/output operation;
Mini-environment within wet bench secures class 1 clean room performance on the wafer surface;
Real time particle monitoring in chemical tanks;
Multiple lot/recipe processing (up to 4 recipes on single bench at the same time);
High throughput and low cost per wafer;
Real time chemical analysis and concentration adjustments:
